Thin Film Metrology

k-Space is a leading manufacturer of in situ, in-line, and ex situ thin film metrology tools designed to improve processes and increase profitability. Our thin film metrology tools are used to monitor nearly all thin-film deposition processes, including MBE, MOCVD, PLD, PVD, sputtering, and evaporation, as well as production. Our products utilize optical imaging technology for non-contact, non-invasive measurement of a plethora of important parameters such as wafer and film temperature, thin-film stress and strain, wafer curvature, bow, and tilt, surface roughness and quality, film thickness and deposition rate, optical band gap, atomic spacing, and other custom non-contact measurements.

kSA thin-film metrology instruments are used in a wide range of deposition processes. kSA products measure and provide thin-film process control for important parameters such as temperature, deposition rate, film thickness, stress, curvature, bow, reflectivity, surface roughness, and many other material properties. These are measured in real-time by utilizing probes such as lasers, white light, UV light sources, and electron beams to investigate at an atomic level.

Our thin-film analysis tools are used to extract real-time information from today’s most advanced deposition and processing applications within compound semiconductor, silicon semiconductor and photovoltaic advanced thin film production and R&D.

Sophisticated software analysis and reporting capabilities provide information to better understand the end product or to provide online control during mass production to enhance yield. Tailored optics and fully integrated solutions have been designed for simple mounting and non-invasive monitoring of many applications such as:

When it comes to thin-film growth, having the right thin-film metrology measurement technique with the accuracy you need is critical. We have been developing and perfecting our thin-film metrology since 1992. What do you want to measure?