Products
k-Space is a leading manufacturer of in situ, in-line, and ex situ metrology tools for the semiconductor, thin-film, and PV industries. Our tools are used for monitoring nearly all thin-film deposition processes, including MBE, MOCVD, PLD, PVD, sputtering, and evaporation. Our products utilize optical imaging technology for non-contact, non-invasive measurement of a plethora of important parameters:
kSA BandiT: In Situ measurement via Band Edge, Blackbody, and Pyrometry, typically used in MBE, PLD, ALD, sputtering, and e-beam evaporation deposition environment
kSA BandiT PV: In-line measurement via Band Edge, Blackbody, and Pyrometry, ideal for thin film PV applications, including in-line production measurement.
kSA ICE: In Situ modular tool for measurement via individual Emissivity Corrected Pyrometry (ECP), Blackbody, and/or Band Edge Modules. Ideal for MOCVD reactors with either high speed or low speed rotation and limited optical access. The ECP module is also available for MBE reactors.
kSA SpectraTemp: In Situ tool used for measuring the absolute temperature of semiconductor wafers, metals, ceramics, and for calibrating other temperature measurement devices, including standard infrared pyrometers.
kSA Scanning Pyro: In Situ tool for creating high resolution, full temperature maps of Veeco K465i and EPIK700 wafer carriers and wafers. Greatly enhances the ability to perform process optimization.
In Situ Thin-Film Stress, Strain and Wafer Curvature
kSA MOS: In Situ tool for measuring real-time film stress, film strain, and wafer curvature induced by thin films or thermal processes on a substrate/wafer.
kSA ICE MOS Module: In Situ modular tool for measuring real-time film stress, film strain and wafer curvature induced by thin films or thermal processes on a substrate/wafer, ideal for MOCVD reactors with high speed or low speed rotation and limited optical access.
Ex Situ Thin-film Stress, Strain, Wafer Curvature, Bow, and Tilt
kSA MOS UltraScan/ThermalScan: Ex Situ tool with full 2D wafer mapping, for measuring film stress, film strain, and wafer curvature, bow, and tilt induced by thin films or thermal processes on a substrate/wafer.
Wafer Curvature, Bow, and Tilt
In Situ Thin-Film Stress, Strain and Wafer Curvature
kSA MOS: In Situ tool for measuring real-time film stress, film strain, and wafer curvature induced by thin films or thermal processes on a substrate/wafer.
kSA ICE MOS Module: In Situ modular tool for measuring real-time film stress, film strain and wafer curvature induced by thin films or thermal processes on a substrate/wafer, ideal for MOCVD reactors with high speed or low speed rotation and limited optical access.
Ex Situ Thin-film Stress, Strain, Wafer Curvature, Bow, and Tilt
kSA MOS UltraScan/ThermalScan: Ex Situ tool with full 2D wafer mapping, for measuring film stress, film strain, and wafer curvature, bow, and tilt induced by thin films or thermal processes on a substrate/wafer.
Surface Roughness and Surface Quality
kSA 400: In Situ tool for measurement via real-time analysis of RHEED (Reflection High Energy Electron Diffraction) patterns, for systems equipped with a RHEED electron gun and phosphor screen. Surface quality is determined by analyzing the RHEED streak profile. RHEED guns are typically installed in MBE and PLD reactors, and occasionally in sputter deposition tools.
kSA BandiT: In Situ measurement via above-gap scatter signal, typically used in MBE, PLD, ALD, sputtering, and e-beam evaporation deposition environments.
kSA BandiT PV: In-line measurement via above-gap scatter signal, ideal for thin film PV applications, including in-line production measurement.
kSA ICE: In Situ modular tool for measurement, measures surface roughness via analysis of above gap scatter signal (must have Band Edge module), ideal for MOCVD reactors with either high speed or low speed rotation and limited optical access.
Film Thickness and Deposition Rate
kSA 400: In Situ tool for measurement via real-time analysis of RHEED (Reflection High Energy Electron Diffraction) patterns, for systems equipped with a RHEED electron gun and phosphor screen. RHEED guns are typically installed in MBE and PLD reactors, and occasionally in sputter deposition tools.
kSA RateRat Pro: In Situ tool for measurement via real-time analysis of thin film interference oscillations during deposition.
kSA BandiT: In Situ tool for measurement via real-time analysis of below gap spectral interference oscillations.
kSA MOS: MOS software option provides in situ measurement via real-time analysis of thin film interference fringes (similar to RateRat technology).
kSA ICE: In Situ modular tool for measurement via individual Emissivity Corrected Pyrometry (ECP), MOS, and/or RateRat modules, ideal for MOCVD reactors with high or low speed rotation and limited optical access.
kSA BandiT PV: In-line measurement via analysis of absorption edge, ideal for thin film PV applications, including in-line production measurement.
kSA 400: In Situ atomic spacing measured in real-time from a calibrated RHEED (Reflection High Energy Electron Diffraction) patterns, for systems equipped with a RHEED electron gun and phosphor screen. RHEED guns are typically installed in MBE and PLD reactors, and occasionally in sputter deposition tools.
Wafer Carrier Characterization
kSA Emissometer: Ex Situ tool designed to quickly and easily generate high resolution
reflectance and total emissivity maps of MOCVD carriers.
In-Line Metrology: Custom metrology for non-contact measurements such as dimensional analysis, surface characterization, thickness and uniformity.
Accurate and precise process monitoring facilitates a clear understanding of the deposition process, ultimately resulting in increased yields and efficiencies. What do you want to measure today? Please go to our Applications page to get started, or sort through our line of thin-film metrology tools listed above. Or feel free to contact us – we look forward to hearing from you!