k-Space Associates, Inc., a leader in in situ, ex situ and in-line metrology tools for the thin-film, semiconductor, photovoltaic (PV), solar, automotive, glass, and building materials industries, has announced increased annual sales for the kSA 400 product line. They reported an increase of 27% in kSA 400 installations in 2018 for their kSA 400 analytical RHEED (Reflection High-Energy Electron Diffraction) system, compared to 2017.
“Our continued increase in system sales is supported by the continued increase in installations for higher pressure deposition technologies, an increase in sales to OEM partners for new deposition chambers, and customer upgrades motivated by our improved product offering and Windows 10 compatibility,” noted kSA Technical Sales Manager, Dr. Carrie Andre. “Features such as triggering with substrate rotation are now more accessible to customers and offer the customer greater insight into the evolution of their RHEED pattern.”
The kSA 400 analytical RHEED system combines a high-resolution, high-speed, and high-sensitivity camera with sophisticated RHEED-specific acquisition and analysis software. Because of its advanced capabilities, continued new feature enhancements, and proven history of over 25 years, the kSA 400 is the preferred analytical RHEED system worldwide for research and manufacturing.
For more information about k-Space or the kSA 400 analytical RHEED system, please visit www.k-space.com.
About k-Space Associates, Inc.
k-Space Associates, Inc. (www.k-space.com) is a leading metrology supplier of in-line, in situ, and ex situ metrology tools for the semiconductor, thin-film, photovoltaic (PV), solar, automotive, glass, and building materials industries. Founded in 1992, its systems are used for monitoring dimensions, wafer temperature, thin-film stress, deposition rate, thickness, material absorption properties, and Reflection High Energy Electron Diffraction (RHEED). Backed by a commitment to ongoing support, these solutions are currently used worldwide in research and production line monitoring of multiple industries. Extensive input and close collaboration with its worldwide customer base have led to the development of today’s most powerful metrology.
