Products
- kSA 400
- kSA BandiT
- kSA BandiT PV
- kSA MOS
- kSA MOS Ultra/Thermal Scan
- kSA RateRat Pro
- kSA ICE
- Accessories
kSA ICE
Real-Time Integrated Metrology for MOCVD
The k-Space Integrated Control for Epitaxy system (ICE) is the most advanced in-situ metrology tool designed specifically for MOCVD process monitoring. This real-time analysis tool is the result of over 15 years of in-situ monitoring development and refinement by k-Space.
Integrated into a single, compact optics head with an overall modular design, kSA ICE provides auto-calibrated temperature, reflectivity, and curvature/bow measurement during MOCVD at rotation speeds up to 3,000 RPM.
Measurement Capabilities
Stress, Reflectivity, Growth Rate and Optical Constants
Complete insight into the GaN and SiC growth process for HBLED and RF power devices is now possible with unmatched repeatability thanks to kSA optical monitoring technologies. The patented stress measurement technique is performed by monitoring the substrate curvature with an array of parallel laser beams, detecting their spacing changes due to film or thermal stress via a CCD detector. The same laser is used in combination with a high speed photo detector to monitor and fit the surface reflectivity, yielding real-time film thickness, growth rate, and optical constants (n, k) while also providing real-time wafer rotation synchronization to simplify wafer tracking.
The patented temperature measurement technique is actually multiple, independent measurements of the wafer carrier/pocket or NIR-opaque substrate Temperature via blackbody spectrum analysis and broadband pyrometry analysis. Even absolute GaN film or GaN/SiC substrate temperature via band-edge thermometry for direct InGaN MQW temperature and LED emission wavelength control.
The system is ideally suited for real-time feedback to process control systems via a TCP/IP interface or analog channel I/O. Proven hardware designs are already in use on today’s commercial R&D and Production MOCVD systems available from Veeco, Aixtron, Taiyo Nippon Sanso, Structured Materials, and many others. Gain insight into your MOCVD process, maximize device performance, and limit process variation to increase yields with kSA ICE!

