Applications
Growth Rate
Monitor and Control
The kSA RateRat provides high-power laser-based, real-time, in-situ deposition rate, layer thickness, optical constants (n,k), and process control. kSA RateRat
When using the kSA MOS in-situ curvature and stress monitoring system, real-time changes in laser intensity also can be used for real-time growth-rate analysis. kSA MOS
Spectroscopic-based, in-situ deposition rate and thickness from pyrometric interference oscillation available during temperature measurement. kSA BandiT
When used with RHEED (Reflection High-Energy Electron Diffraction) equipped systems, RHEED intensity oscillations observed during epitaxial growth can be used to determine growth rate and thickness. kSA 400
Need recipe-controlled deposition with advanced process control?
How about multi-wafer growth rate during substrate rotation?
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Please contact us to discuss your real-time monitoring needs.