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Application Notes
kSA MOS Ultra-Scan Application Notes are documents written about a specific component or components of the kSA MOS Ultra-Scan curvature and stress measurement system. These documents are designed to explain details of the kSA MOS Ultra-Scan capabilities and aid the user in maximizing the utility of the system. k-Space User Manuals are available for download as well by contacting us.
Note that some documents contain proprietary information, and therefore are password protected. At this time, if you are a k-Space customer, please email us and we will send you the document.
- 300mm SOI Wafer Curvature Repeatability Study
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White Papers
k-Space white papers are documents that describe a technology or technologies utilized by a k-Space product. White papers may also include calibration procedures, application to various technologies, or comparisons with similar products.
Note that some documents may contain proprietary information, and therefore are password protected. If you are a k-Space customer, please email us requesting a username and password, and we will respond via email with a proper username and password, allowing you access to the document.
- Resolution and sensitivity of stress measurements with the k-Space Multi-beam Optical Sensor (MOS) System
- Eric Chason
- Sandia National Laboratories
- kSA MOS Ultra-Scan: Scanning Curvature and Stress Measurement System
- A PDF presentation describing the kSA MOS Ultra-Scan system, including both hardware and software components. Data taken using the MOS Ultra-Scan is also presented, including stress measured on a Si wafer and a full wafer curvature map.
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References
k-Space references are a compilation of published papers that either offer a review of the techniques used by the kSA MOS Ultra-Scan, or specifically use the kSA MOS Ultra-Scan for work within the paper.
- There are no references at this time, however, you may wish to see the MOS references because the Ultra-Scan is an ex-situ tool built on MOS technology.
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