k-Space Associates introduces the kSA MOS Thermal-Scan for thermal stress analysis of wafer samples from room temperature to 1000°C.

The kSA MOS Thermal-Scan provides a high thermal uniformity vacuum heating system with inert gas introduction. Coupled with patented kSA MOS technology—the highest stress resolution available today—this new system provides complete dynamic and static thermal stress analysis of samples up to 100mm in diameter.

For more information on the kSA MOS Thermal-Scan, please contact us.