k-Space Associates, Inc.

  • ProductkSA BandiT

    Repeatable and Accurate Temperature Measurement

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  • ProductkSA MOS

    2D Real-Time, In Situ Film and Thermal Stress Monitoring

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  • Product kSA MOS Ultra/Thermal-Scan

    2D Film Stress and Absolute Curvature Mapping

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  • ProductkSA ICE

    Real-Time, In Situ Process Monitoring and Control for MOCVD

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  • ProductkSA BandiT PV

    In-line PV Process Monitoring to Increase Performance and Yield

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  • ProductkSA RateRat

    Real-time Thickness Monitoring of Multilayer Thin Films

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  • ProductkSA 400

    The World's Leading Analytical RHEED System

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  • ProductkSA SpectraTemp

    Absolute Temperature Made Absolutely Easy!

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  • ProductkSA Scanning Pyro

    Full Carrier Temperature Maps at the Click of a Button!

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Leaders in Advanced Thin-Film Metrology Solutions for Research, Development, and Production

k-Space Associates, Inc. is a leading manufacturer of in situ, in-line, and ex situ metrology tools for the semiconductor, thin-film, and photovoltaic (PV) industries.  Our tools are used for monitoring nearly all thin-film deposition processes, including MBE, MOCVD, PLD, PVD, ALD, sputtering, and evaporation.

World Class Technical Support

We take pride in providing the best technical support in the industry. No automated queues, no slow response times. When you call, you’ll always get a friendly k-Space person to direct your call to the appropriate engineer. Or, contact us via email – we guarantee we’ll respond within 1 business day. Contact us today so we can discuss your metrology needs.

We look forward to hearing from you!

Curious about our company? Check out our video featuring our facility, our people and where we turn ideas into reality!

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What We Do

k-Space metrology tools focus on real-time data acquisition, processing, and analysis of nearly all deposition parameters of importance, including: wafer and film temperature, thin-film stress and strain, wafer curvature, bow, and tilt, surface roughness and quality, film thickness and deposition rate, optical band gap and atomic spacing. We also supply ex situ wafer and surface analysis tools which perform full curvature, stress, and wafer bow mapping on up to 300mm wafers.

Our tools are used in today’s most advanced deposition and processing applications within compound semiconductor, silicon semiconductor and photovoltaic advanced thin film production and R&D.  Sophisticated software analysis and reporting capabilities provide information to better understand tomorrow’s electronic and optoelectronic devices or to provide online control during mass production to enhance yield. Tailored optics and fully integrated solutions have been designed for simple mounting and non-invasive monitoring of advanced deposition processes such as: MOCVD, MBE, sputtering, thermal and e-beam evaporation, and PLD.